3D nanolithography has been around for decades, but now we have a new tool that can take this technology to the next level. The X-Photon, developed by researchers at TU Wien, is a powerful 3D lithography system that can be used to create complex nanoscale structures with extreme precision. The X-Photon is the first system to use extreme ultraviolet (EUV) radiation to create these nanoscale structures and devices. This allows for much faster fabrication times and higher resolution than ever before. The X-Photon is capable of producing features with a resolution of just a few nanometers, and it can complete the entire process in mere seconds. This makes it possible to create complex nanostructures with unprecedented speed and precision. The potential applications of this technology are almost limitless, and it is sure to revolutionize the field of nanotechnology.

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source: Phys.org