Today, researchers have created a tool that promises to revolutionize the way we create microchips. This tool is a new type of plasma source that can simultaneously etch and deposit material onto a microchip. The plasma source works by using a combination of a high-powered laser and a nanosecond pulsed power supply, allowing for precise material deposition and etching. This breakthrough technology promises to make the process of creating microchips faster, more reliable, and more efficient. With the help of this new plasma source, the future of microchip manufacturing is looking brighter than ever.

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source: Phys.org