A new technology for surface coating materials has been developed by researchers from the University of Cambridge, which could revolutionise the way materials are used for electronic and photonic applications. The technology, which is based on a process called atomic layer deposition (ALD), will enable precise control of the thickness, composition, and structure of the coatings, enabling the production of thin layers of materials with a range of unusual properties. The technology is expected to open up a wide range of new possibilities for the development of materials with unique electrical, optical and thermal properties, which could be used in a variety of applications.

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source: Phys.org