A new scalable etching-based technique has been developed to precisely tune the properties of nanostructures. This technique is capable of tuning the size, shape, and electronic properties of nanostructures, such as those used in nanoelectronics and photonics. The new technique combines chemical etching with lithography to create nanostructures with highly precise properties. The researchers believe that this technique will be useful in applications such as nanophotonics, nanoelectronics, and optoelectronics. Additionally, this technique could be used to create nanostructures for a variety of scientific and technological applications.

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source: Phys.org